Field emission properties of carbon nanotube arrays on the thickness-controlled flexible substrate by the pattern transfer process

Chia Tsung Chang*, Chuan Ping Juan, Yi Chan Lin, Wan Lin Tsai, Po Yu Yang, I. Che Lee, Yu Ren Li, Huang-Chung Cheng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

A technigal with the polydimethylsiloxane (PDMS) solution in?ltrated into the SiO x-coated CNTAs has been utilized to directly transfer the CNTAs away from the silicon substrate. The oxide coating layer was utilized to protect the morpholgy of as-grown patterned vertical aligmed carbon nanotube (CNTs) arrays. The high density plasma reactive ions etching (HDP-RIE) system was used to make the CNTs emerge from the surface of the ?exible substrate and modify the crystallines of CNTs. After the protecting oxide was HDP-RIE-processed for 8 min, the emission current properties were enhanced to be 1.03 V/μm and 1.43 V/μm, respectively, for the turn-on ?eld and the threshold ?eld, as compared with 1.25 V/μm and 1.59 V/μm for the as-grown CNTs, accordingly. The Field Emission (FE) enhancement after dry etching could be attributed to the open-ended structures and better crystalline.

Original languageEnglish
Pages (from-to)5742-5746
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume12
Issue number7
DOIs
StatePublished - 1 Jul 2012

Keywords

  • Carbon Nanotube (CNT)
  • Field Emission
  • Flexible
  • Polydimethylsiloxane (PDMS)

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