Femtosecond laser ablation dynamics of amorphous film of a substituted Cu-phthalocyanine

Yoichiroh Hosokawa, Masaki Yashiro, Tsuyoshi Asahi, Hiroshi Fukumura, Hiroshi Masuhara

Research output: Contribution to journalConference articlepeer-review

41 Scopus citations

Abstract

Femtosecond laser ablation dynamics of an amorphous thin film of a substituted Cu-phthalocyanine was studied using time-resolved absorption spectroscopic and scattering imaging methods. Above the ablation threshold of 45 mJ/cm2, the etch-depth is about 400 nm and almost constant up to a laser fluence of 300 mJ/cm2. Transient absorption spectra confirmed that the electronic excitation energy is converted to heat through exciton-exciton annihilation within 100 ps after excitation. The etching profile and ablation threshold are discussed in connection with the heating rate.

Original languageEnglish
Pages (from-to)192-195
Number of pages4
JournalApplied Surface Science
Volume154
DOIs
StatePublished - 1 Feb 2000
EventThe Symposium A on Photo-Excited Processes, Diagnostics and Applications of the 1999 E-MRS Spring Conference (ICPEPA-3) - Strasbourg, France
Duration: 1 Jun 19994 Jun 1999

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