Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Jue Chin Yu, Pei-Chen Yu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.

Original languageEnglish
Title of host publicationOptical Microlithography XXIII
PublisherSPIE
ISBN (Print)9780819480545
DOIs
StatePublished - 1 Jan 2010
EventOptical Microlithography XXIII - San Jose, CA, United States
Duration: 23 Feb 201025 Feb 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7640
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptical Microlithography XXIII
CountryUnited States
CitySan Jose, CA
Period23/02/1025/02/10

Keywords

  • image gradient
  • inverse lithography
  • optical proximity correction

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