Fast converging inverse lithography algorithm incorporating image gradient descent methods

Jue Chin Yu*, Peichen Yu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

In this paper, we develop an image-gradient-based algorithm to simultaneously optimize various cost functions for inverse mask design. The algorithm employs an iterative approach which evaluates the gradient decent of the resist image, aerial image, and the aerial image contrast with a pre-assigned step length. Moreover, an independent iteration step is inserted among iterations for binary mask conversion. We show that the proposed algorithm allows fast convergence while achieving high aerial image contrast. The impacts of each cost function on the pattern fidelity and convergence are also discussed.

Original languageEnglish
Title of host publicationLithography Asia 2009
DOIs
StatePublished - 1 Dec 2009
Event2009 Lithography Asia Conference - Taipei, Taiwan
Duration: 18 Nov 200919 Nov 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7520
ISSN (Print)0277-786X

Conference

Conference2009 Lithography Asia Conference
CountryTaiwan
CityTaipei
Period18/11/0919/11/09

Keywords

  • Image gradient
  • Inverse lithography
  • Optical proximity correction

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