Fabry-Perot type antireflective coatings for binary mask applications in ArF and F 2 excimer laser lithographies

H. L. Chen, C. C. Lee, Y. F. Chuang, M. C. Liu, C. I. Hsieh, Fu-Hsiang Ko

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F 2 excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.

Original languageEnglish
Title of host publicationCLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics
Subtitle of host publicationPhotonics Lights Innovation, from Nano-Structures and Devices to Systems and Networks, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages1
ISBN (Electronic)0780377664
DOIs
StatePublished - 1 Jan 2003
Event5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003 - Taipei, Taiwan
Duration: 15 Dec 200319 Dec 2003

Publication series

NamePacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
Volume2

Conference

Conference5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003
CountryTaiwan
CityTaipei
Period15/12/0319/12/03

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    Chen, H. L., Lee, C. C., Chuang, Y. F., Liu, M. C., Hsieh, C. I., & Ko, F-H. (2003). Fabry-Perot type antireflective coatings for binary mask applications in ArF and F 2 excimer laser lithographies. In CLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics: Photonics Lights Innovation, from Nano-Structures and Devices to Systems and Networks, Proceedings [1277293] (Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest; Vol. 2). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/CLEOPR.2003.1277293