Fabrication of ZnO thin films by femtosecond pulsed laser deposition

Joseph Lik Hang Chau, Min Chieh Yang, Takahiro Nakamura, Shunichi Sato, Chih Chao Yang, Chung-Wei Cheng

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


The growth of ZnO thin films on sapphire substrate using the femtosecond PLD technique is reported. The effect of substrate temperature and oxygen pressure on the structural properties of the films was studied. Highly c-axis oriented ZnO films can be grown on sapphire substrates under vacuum conditions using the femtosecond PLD process. There is an optimum substrate temperature for the pulsed laser deposition of ZnO film that enhances the thermodynamic stability and allows the formation of well-crystallized thin films. The crystal quality of the films can be further improved by increasing the deposition time and introducing oxygen during the pulsed laser deposition process.

Original languageEnglish
Pages (from-to)1337-1339
Number of pages3
JournalOptics and Laser Technology
Issue number8
StatePublished - 1 Nov 2010


  • Femtosecond
  • Thin films
  • Zinc oxide

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