Fabrication of SiC membrane HCG blue reflector using nanoimprint lithography

Ying Yu Lai, Akihiro Matsutani, Tien-chang Lu*, Shing Chung Wang, Fumio Koyama

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Scopus citations

Abstract

We designed and fabricated a suspended SiC-based membrane high contrast grating (HCG) reflectors. The rigorous coupled-wave analysis (RCWA) was employed to verify the structural parameters including grating periods, grating height, filling factors and air-gap height. From the optimized simulation results, the designed SiC-based membrane HCG has a wide reflection stopband (reflectivity (R) <90%) of 135 nm for the TE polarization, which centered at 480 nm. The suspended SiC-based membrane HCG reflectors were fabricated by nanoimprint lithography and two-step etching technique. The corresponding reflectivity was measured by using a micro-reflectivity spectrometer. The experimental results show a high reflectivity (R<90%), which is in good agreement with simulation results. This achievement should have an impact on numerous III-N based photonic devices operating in the blue wavelength or even ultraviolet region.

Original languageEnglish
Title of host publicationHigh Contrast Metastructures IV
EditorsWeimin Zhou, Fumio Koyama, Connie J. Chang-Hasnain, David Fattal
PublisherSPIE
ISBN (Electronic)9781628414622
DOIs
StatePublished - 1 Jan 2015
EventHigh Contrast Metastructures IV - San Francisco, United States
Duration: 11 Feb 201512 Feb 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9372
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceHigh Contrast Metastructures IV
CountryUnited States
CitySan Francisco
Period11/02/1512/02/15

Keywords

  • HCG
  • III-N
  • Nanoimprint
  • SiC

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