Fabrication of novel structures on silicon with femtosecond laser pulses

W. C. Shen, Chung-Wei Cheng*, M. C. Yang, Y. Kozawa, S. Sato

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


In this study, the fabrication of novel micro/nano structures were induced on silicon surfaces us-ing radially and azimuthally polarized femtosecond laser, with a ~120 fs pulse duration, an 800 nm wavelength, and a 1 kHz repetition rate. Results showed that, as the laser fluence approached the ab-lation threshold of the silicon, nanostructures with a period of approximately 600~700 nm were formed at the low laser fluence region (0.7~0.8 J/cm2), and their orientations were perpendicular to the laser polarization. However, as the laser fluence increased (0.9~1.1 J/cm2), microstructures with a period of approximately 2~3 μm were formed, and their orientation were parallel to the laser polarization.

Original languageEnglish
Pages (from-to)229-232
Number of pages4
JournalJournal of Laser Micro Nanoengineering
Issue number3
StatePublished - 1 Dec 2010


  • Azimuthal polarization
  • Femtosecond laser
  • Nanostructure
  • Radial polarization

Fingerprint Dive into the research topics of 'Fabrication of novel structures on silicon with femtosecond laser pulses'. Together they form a unique fingerprint.

Cite this