Fabrication of metal-oxide-semiconductor devices with extreme ultraviolet lithography

K. B. Nguyen*, G. F. Cardinale, D. A. Tichenor, G. D. Kubiak, K. Berger, A. K. Ray-Chaudhuri, Y. Perras, S. J. Haney, R. Nissen, K. Krenz, R. H. Stulen, H. Fujioka, Chen-Ming Hu, J. Bokor, D. M. Tennant, L. A. Fetter

*Corresponding author for this work

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