Fabrication and simulation of neutral-beam-etched silicon nanopillars

Min Hui Chuang, Daisuke Ohori, Yiming Li*, Kuan Ru Chou, Seiji Samukawa

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

In this study, we do the experiment and simulation of the silicon nanopillars fabricated by a damage-free neutral-beam-etching system combined with bio-template-mask technology. The fabricated silicon nanopillars are with the diameter of 16 nm and the height of 90 nm and the density is 6.5 × 1010/cm2 with variation of 3%. We model and simulate the fabricated silicon nanopillars by periodical cylinder in Si0.7Ge0.3 matrix to estimate the energy profile with different wave vectors. The variations of the energy with respect to the height, diameter, and the separation of the simulated silicon nanopillars are reported. The results of this work will be useful for thermoelectric applications.

Original languageEnglish
Article number109577
JournalVacuum
Volume181
DOIs
StatePublished - Nov 2020

Keywords

  • Energy-band profile
  • Fabrication process
  • Neutral-beam etching
  • Silicon nanopillar
  • Simulation

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