Fabrication and characterization of the Pd-silicided emitters for field-emission devices

Chih Chong Wang*, Tze Kun Ku, Ming Shiann Feng, Iing Jar Hsieh, Huang-Chung Cheng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The structure of Pd-silicided field emitters based on the silicon micromachining technology has been demonstrated. The uniform and extremely sharp silicided emitters are formed using wet chemical etching, low-temperature oxidation sharpening, coating metal and furnace annealing in N 2 ambient. The sheet resistance and Auger electron spectroscope results depict the transformation of silicidation. Transmission electron microscope of bright-field, dark-field, and diffraction pattern show the formation of silicided emitters. These emitters have potential applications in vacuum microelectronics to obtain superior lifetime, relaibility, and stability.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsWayne Bailey, M.Edward Motamedi, Fang-Chen Luo
Pages145-152
Number of pages8
DOIs
StatePublished - 1 Dec 1995
EventMicroelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications - Austin, TX, USA
Duration: 24 Oct 199524 Oct 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2641
ISSN (Print)0277-786X

Conference

ConferenceMicroelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications
CityAustin, TX, USA
Period24/10/9524/10/95

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    Wang, C. C., Ku, T. K., Feng, M. S., Hsieh, I. J., & Cheng, H-C. (1995). Fabrication and characterization of the Pd-silicided emitters for field-emission devices. In W. Bailey, M. E. Motamedi, & F-C. Luo (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (pp. 145-152). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2641). https://doi.org/doi.org/10.1117/12.220936