GaN-based resonant-cavity light-emitting diodes (RCLEDs) have been fabricated on Si substrates by a combination of laser lift-off and wafer bonding techniques. The RCLED structure consisted of an In-GaN/GaN multiple-quantum- well active layer between the top (5-pairs) and bottom (7.5-pairs) dielectric TiO2/SiO2 distributed Bragg reflector (DBR) with an optical reflectance of 85 and 99.9%, respectively. The cavity mode of the RCLED shows a linewidth of 5.5 nm at a main emission peak at 525 nm. The emission full width at half maximum can decrease from 48 to 35 nm, indicating the effect of the DBR microcavity. The quality factor for this resonant cavity structure was estimated to be approximately 100.
|Number of pages||4|
|Journal||Physica Status Solidi (C) Current Topics in Solid State Physics|
|State||Published - 31 Jul 2006|
|Event||6th International Conference on Nitride Semiconductors, ICNS-6 - Bremen, Germany|
Duration: 28 Aug 2005 → 2 Sep 2005