Fabrication and characterization of diamond-clad silicon field emitter arrays

Huang-Chung Cheng, Tzu Kun Ku, Biing Bang Hsieh, Sheng Hsiung Chen, Shye Yuh Leu, Chih Chong Wang, Chia Fu Chen, Iing Jar Hsieh, Jammy C. Jammy

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17 Scopus citations

Abstract

Microsized silicon tip arrays with sharp curvature were formed based on the techniques including reactive ion etching and oxidation-sbarpening. A new fabrication technology of poly crystalline diamond-clad Si microtips using microwave plasma CVD (MPCVD) was subsequently developed to improve the capability and stability of thefield emission from the pure Si tips. By means of SEM and transmission electron microscopy (TEM), the as-deposited films are found to be polycrystalline diamond with fine grain (˜800 A) structure. With the anode voltage of 1100 V and anode-to-cathode distance of 30 μm, the emission current of 240 μA in a 50 x 50 diamond-cladSi microtip array can be achieved, which is much higher than those for Cr-clad and pure Si microtip arrays. Basedon curve fitting of a Fowler-Nordheim (F-N) plot, such great improvement is partially attributed to the loweringof the effective work function from 5.5 eV to 2.08 eV.

Original languageEnglish
Pages (from-to)6926-6931
Number of pages6
JournalJapanese Journal of Applied Physics
Volume34
Issue number12
DOIs
StatePublished - 1 Jan 1995

Keywords

  • Diamond-clad Si microtips
  • Effective work function
  • Field emission
  • Fowler-Nordheim (F-N) plot
  • Microwave plasma CVD

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    Cheng, H-C., Ku, T. K., Hsieh, B. B., Chen, S. H., Leu, S. Y., Wang, C. C., Chen, C. F., Hsieh, I. J., & Jammy, J. C. (1995). Fabrication and characterization of diamond-clad silicon field emitter arrays. Japanese Journal of Applied Physics, 34(12), 6926-6931. https://doi.org/10.1143/JJAP.34.6926