Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin*, Ken-Yuh Hsu, Wei Zheng Chen, Wha Tzong Whang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

6 Scopus citations

Abstract

We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

Original languageEnglish
Pages (from-to)100-106
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3801
DOIs
StatePublished - 1 Dec 1999
EventProceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V - Denver, CO, USA
Duration: 18 Jul 199919 Jul 1999

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