Excitation wavelength dependence of laser ablation mechanism of urethane-urea copolymer film studied by nanosecond time-resolved interferometry

Takuji Tada*, Tsuyoshi Asahi, Masaaki Tsuchimori, Osamu Watanabe, Hiroshi Masuhara

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Etching dynamics of urethane-urea copolymer film was investigated by utilizing nanosecond time-resolved interferometry and tuning excitation wavelength. From the behavior of fringe pattern deformation at the irradiated areas, it is considered that irradiated polymer film was decomposed more effectively with decrease in excitation wavelength. Excitation wavelength dependence of etching dynamics of urethane-urea copolymer film was not well interpreted in terms of total energy density which was stored within the polymer film due to laser irradiation, while photochemical and photothermal processes can explain mostly the results of shorter wavelength (≤ 475 nm) and longer wavelength (≥ 530 nm) excitations, respectively.

Original languageEnglish
Pages (from-to)373-381
Number of pages9
JournalJournal of Nonlinear Optical Physics and Materials
Volume13
Issue number3-4
DOIs
StatePublished - 1 Jan 2004

Keywords

  • Azo polymer
  • Laser ablation
  • Nanosecond interferometry

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