Etching dynamics of urethane-urea copolymer film was investigated by utilizing nanosecond time-resolved interferometry and tuning excitation wavelength. From the behavior of fringe pattern deformation at the irradiated areas, it is considered that irradiated polymer film was decomposed more effectively with decrease in excitation wavelength. Excitation wavelength dependence of etching dynamics of urethane-urea copolymer film was not well interpreted in terms of total energy density which was stored within the polymer film due to laser irradiation, while photochemical and photothermal processes can explain mostly the results of shorter wavelength (≤ 475 nm) and longer wavelength (≥ 530 nm) excitations, respectively.
|Number of pages||9|
|Journal||Journal of Nonlinear Optical Physics and Materials|
|State||Published - 1 Jan 2004|
- Azo polymer
- Laser ablation
- Nanosecond interferometry