Evaluation on ESD robustness of LTPS diode and TFT device by Transmission Line Pulsing (TLP) technique

Ming-Dou Ker, Tang Kui Tseng, Sheng Chieh Yang, An Shih, Yaw Ming Tsai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

ESD robustness of Low Temperature Poly-Si (LTPS) diodes and TFT devices has been investigated in this paper. By using the Transmission Line Pulsing (TLP) techniques, the lt2 (secondary breakdown current) of LTPS diodes and TFT devices were measured. To evaluate the ESD robustness of components for ESD protection, the shifts of breakdown voltage and cut-in voltage of LTPS diode and TFT devices after TLP stress are considered into failure threshold judgment. From the experimental results, It2 of LTPS diodes under forward-biased stress is better than that of LTPS TFT devices. Furthermore, the It2 of LTPS TFT devices under reversebiased stress is more robust than it under forward-biased stress. Such investigation results can help us to design a successful ESD protection for the circuits on glass.

Original languageEnglish
Title of host publicationVLSI 2003 - 2003 20th International Symposium on VLSI Technology, Systems and Applications, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages88-91
Number of pages4
ISBN (Electronic)0780377656
DOIs
StatePublished - 1 Jan 2003
Event20th International Symposium on VLSI Technology, Systems and Applications, VLSI 2003 - Hsinchu, Taiwan
Duration: 6 Oct 20038 Oct 2003

Publication series

NameInternational Symposium on VLSI Technology, Systems, and Applications, Proceedings
Volume2003-January
ISSN (Print)1930-8868

Conference

Conference20th International Symposium on VLSI Technology, Systems and Applications, VLSI 2003
CountryTaiwan
CityHsinchu
Period6/10/038/10/03

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  • Cite this

    Ker, M-D., Tseng, T. K., Yang, S. C., Shih, A., & Tsai, Y. M. (2003). Evaluation on ESD robustness of LTPS diode and TFT device by Transmission Line Pulsing (TLP) technique. In VLSI 2003 - 2003 20th International Symposium on VLSI Technology, Systems and Applications, Proceedings (pp. 88-91). [1252559] (International Symposium on VLSI Technology, Systems, and Applications, Proceedings; Vol. 2003-January). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/VTSA.2003.1252559