Erratum: Room-temperature deposition of a poling-free ferroelectric AlScN film by reactive sputtering (Applied Physics Letters (2021)118 (082902) DOI: 10.1063/5.0035335)

Sung Lin Tsai, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Tien Kan Chung, Edward Y. Chang, Kuniyuki Kakushima*

*Corresponding author for this work

Research output: Contribution to journalComment/debate

Abstract

This article was originally published online on 25 February 2021 with an error in the affiliation. The affiliation is correct above. All online and printed versions of the article were corrected on 3 March 2021.

Original languageEnglish
Article number109901
JournalApplied Physics Letters
Volume118
Issue number10
DOIs
StatePublished - 8 Mar 2021

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