Erratum: Kinetics of the formation of hafnium silicides on silicon (Journal of Applied Physics (1973) 44 (3851))

J. F. Ziegler*, J. W. Mayer, C. J. Kircher, King-Ning Tu

*Corresponding author for this work

Research output: Contribution to journalComment/debate

1 Scopus citations
Original languageEnglish
Number of pages1
JournalJournal of Applied Physics
Volume45
Issue number10
DOIs
StatePublished - 1 Dec 1974

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