Erratum: Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (Journal of the Electrochemical Society (2003) 150 (G22))

Bing-Yue Tsui*, Chih Feng Huang

*Corresponding author for this work

Research output: Contribution to journalComment/debate

1 Scopus citations
Original languageEnglish
JournalJournal of the Electrochemical Society
Volume150
Issue number5
DOIs
StatePublished - 1 May 2003

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