Enlarging lens design with f-Θ lens for real time laser lithography inspections

Kuang Lung Huang*, Mei Chu, Cheng-Huan Chen, Yu Chung Lin, Min Kai Lee, Sung Ho Liu

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

An enlarging lens, composed of a charge-coupled-device (CCD) lens and an f-Θ lens, has been designed for real time laser lithography visual inspection purposes. The object of this design is to enlarge the image of the working specimens in real time, which used to be done by an independent magnifying system after the lithography process. F-Θ lens has both roles in this design, being a laser lithography lens and a specimen imaging lens. A beam splitter has been inserted between the f-Θ lens and the CCD lens, which divides the UV laser beam and the visible beam to form a coaxial system. This design also reaches the image requirements in both wavelength bands, that the value of MTF is nearly diffraction-limit in UV wavelength and greater than 0.45 at 40 c/mm in visible wavelength.

Original languageEnglish
Pages (from-to)72-75
Number of pages4
JournalOptical Review
Volume18
Issue number1
DOIs
StatePublished - 1 Jan 2011

Keywords

  • Laser lithography
  • Lens design
  • Visual inspection

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