Enhancement of stress-memorization technique on nMOSFETs by multiple strain-gate Engineering

Tsung Yi Lu, Chin Meng Wang, Tien-Sheng Chao*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

An enhanced stress memorization-technique that utilizes a strain proximity free technique (SPFT) and a stacked-gate structure has been demonstrated by multiple strain-gate engineering. The electron mobility of n-channel metal-oxide semiconductor field effect transistors (nMOSFETs) with SPFT exhibit a 16% increase compared to that of counterpart techniques. SPFT avoids the limitation of stressor volume for performance improvement in high-density complementary metal oxide semiconductor circuits. We also found that optimization of stacked, random poly-Si-grain gate structure in combination with SPFT can improve mobility further to 22% more than a single poly-Si gate structure without SPFT.

Original languageEnglish
JournalElectrochemical and Solid-State Letters
Volume12
Issue number1
DOIs
StatePublished - 19 Nov 2008

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