Enhancement of open-circuit voltage using CF 4 Plasma treatment on nitric acid oxides

Je Wei Lin, Chien Hung Wu, Sheng Wei Wu, Wei Ping Hseih, Chen Hsu Du, Tien-Sheng Chao

Research output: Contribution to journalArticle

Abstract

Surface passivation of solar cells is investigated using CF 4 plasma treatment on low-temperature oxides to enhance the open-circuit voltage of the solar cells. Low-temperature oxides grown by a nitric acid solution are treated with the CF 4 plasma. Solar cells undergoing this scheme show an improved performance, including low-saturation current density and good quantum efficiency at short wavelengths. Experimental results demonstrate that the CF 4 plasma pretreatment on low-temperature oxides can significantly improve the open-circuit voltage, short-circuit current, and fill factor for silicon wafer-based solar cells. This technique is very promising for in-line solar cell manufacturing.

Original languageEnglish
Article number6495702
Pages (from-to)665-667
Number of pages3
JournalIEEE Electron Device Letters
Volume34
Issue number5
DOIs
StatePublished - 7 May 2013

Keywords

  • CF plasma
  • low-temperature oxides
  • open-circuit voltage
  • surface passivation

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