Enhancement of critical current density in direct-current-sputtered TlBa 2 Ca 2 Cu 3 O 9±δ superconducting thin films

Jenh-Yih Juang*, J. H. Horng, S. P. Chen, C. M. Fu, Kaung-Hsiung Wu, T. M. Uen, Y. S. Gou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

31 Scopus citations


A multistep postannealing scheme has been developed for preparing nearly single phased, c-axis oriented TlBa 2 Ca 2 Cu 3 O x (Tl-1223) superconducting thin films fabricated by the direct-current-sputtering process. Films obtained by the present process have shown, for the first time in this system, a critical current density (J c ) above 10 6 A/cm 2 at 77 K with a zero-resistance transition temperature T c0 ≈110K. The order of magnitude enhancement in J c is attributed to the improvement of film morphology which, in turn, removed most of the weak links encountered previously.

Original languageEnglish
Number of pages1
JournalApplied Physics Letters
StatePublished - 1 Dec 1995

Fingerprint Dive into the research topics of 'Enhancement of critical current density in direct-current-sputtered TlBa <sub>2</sub> Ca <sub>2</sub> Cu <sub>3</sub> O <sub>9±δ</sub> superconducting thin films'. Together they form a unique fingerprint.

Cite this