Enhanced short-channel effects in NMOSFETs due to boron redistribution induced by arsenic source and drain implant

D. K. Sadana, A. Acovic, G. Shahidi, H. Hanafi, A. C. Warren, D. Grutzmacher, F. Cardone, J. Sun, B. Davari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

19 Scopus citations

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