Ellipsometric measurements and its alignment: Using the intensity ratio technique

Yu Faye Chao Yschao, Chi Shin Wei, Wen Chi Lee, Shy Chaung Lin, Tien-Sheng Chao

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Using first-order treatment on azimuth errors of the polarizer (P) and analyzer (A) with respect to the plane of incidence (POI), we construct two intensity ratios around a certain configuration, such as P= ±п/4 and A = 0 as compared to A = п/2. These expressions can be used not only to align the azimuths of the polarizer and analyzer to the POI, but also to obtain the ellipsometric parameter Ψ without locating the minimum intensity. BK7 glass and Si02/Si thin film are ultilized to evaluate this technique.

Original languageEnglish
Pages (from-to)5016-5019
Number of pages4
JournalJapanese Journal of Applied Physics
Volume34
Issue number9R
DOIs
StatePublished - 1 Jan 1995

Keywords

  • Ellipsometry
  • Polarimetry
  • Refractive index
  • Thin film

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