Electrical properties of SiN/GaN MIS diodes formed by ECR-CVD

Kow-Ming Chang, Chao Chen Cheng, Chia Ching Lang

Research output: Contribution to journalArticle

33 Scopus citations

Abstract

Silicon nitride (SiN) film was deposited at 300 °C as the insulating layer of a GaN-based metal-insulator-semiconductor (MIS) diode by using electron cyclotron resonance chemical vapor deposition (ECR-CVD) with silane-to-nitrogen (SiH4/N2) flow ratio of 5/45. The deposited film had the refractive index of 1.9-2.0 and the relative dielectric constant of 6. Capacitance-voltage (C-V) characteristics were measured at 1 MHz and interface state densities were obtained by Terman's method. The negative fixed charge density of the SiN film was 1.1 × 1011 cm-2 and its breakdown field was greater than 5.7 MV/cm even at 350 °C. The value of the interface state density was less than 4 × 1011 cm-2 around the mid-gap and its minimum was 5 × 1010 cm-2 eV-1 at 0.6 eV below the conduction band edge. From these results, the SiN film deposited by ECR-CVD is a promising gate dielectric for high temperature GaN-MISFET application.

Original languageEnglish
Pages (from-to)1399-1403
Number of pages5
JournalSolid-State Electronics
Volume46
Issue number9
DOIs
StatePublished - 1 Jan 2002

Keywords

  • ECR
  • GaN
  • Gate dielectric
  • MISFET
  • Silicon nitride

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