Electrical characteristics of thin HfO 2 gate dielectrics prepared using different pre-deposition surface treatments

Ching Wei Chen, Chao-Hsin Chien*, Tsu Hsiu Perng, Ming Jui Yang, Jann Shyang Liang, Peer Lehnen, Bing-Yue Tsui, Chun Yen Chang

*Corresponding author for this work

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Engineering & Materials Science

Physics & Astronomy