Abstract
Electrical and reliability properties of ultrathin La2O3 gate dielectric have been investigated. The measured capacitance of 33 angstrom La2O3 gate dielectric is 7.2 μF/cm2 that gives an effective K value of 27 and an equivalent oxide thickness of 4.8 angstrom. Good dielectric integrity is evidenced from the low leakage current density of 0.06 A/cm2 at -1 V, high effective breakdown field of 13.5 MV/cm, low interface-trap density of 3 × 1010 eV-1/cm2, and excellent reliability with more than 10 years lifetime even at 2 V bias. In addition to high K, these dielectric properties are very close to conventional thermal SiO2.
Original language | English |
---|---|
Pages (from-to) | 341-343 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 21 |
Issue number | 7 |
DOIs | |
State | Published - 1 Jul 2000 |