Efficiency Enhancement of Multicrystalline Silicon Solar Cells by Inserting Two-Step Growth Thermal Oxide to the Surface Passivation Layer

Shun Sing Liao, Yueh Chin Lin, Chuan Lung Chuang, Edward Yi Chang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

In this study, the efficiency of the multicrystalline was improved by inserting a two-step growth thermal oxide layer as the surface passivation layer. Two-step thermal oxidation process can reduce carrier recombination at the surface and improve cell efficiency. The first oxidation step had a growth temperature of 780°C, a growth time of 5 min, and with N 2 /O 2 gas flow ratio 12: 1. The second oxidation had a growth temperature of 750°C, growth time of 20 min, and under pure N 2 gas environment. Carrier lifetime was increased to 15.45 μs, and reflectance was reduced 0.52% using the two-step growth method as compared to the conventional one-step growth oxide passivation method. Consequently, internal quantum efficiency of the solar cell increased 4.1%, and conversion efficiency increased 0.37%. These results demonstrate that the two-step thermal oxidation process is an efficient way to increase the efficiency of the multicrystalline silicon solar cells.

Original languageEnglish
Article number9503857
Pages (from-to)1-6
Number of pages6
JournalInternational Journal of Photoenergy
Volume2017
DOIs
StatePublished - 8 Oct 2017

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