Effects of wet chemical and trimethyl aluminum treatments on the interface properties in atomic layer deposition of Al2O3 on InAs

Hai Dang Trinh*, Edward Yi Chang, Yuen Yee Wong, Chih Chieh Yu, Chia Yuan Chang, Yueh Chin Lin, Hong Quan Nguyen, Binh Tinh Tran

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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