Abstract
In this study, various Alqa amorphous layers are prepared by vacuum deposition at different substrate temperatures Tsub. The surface morphology, structural information, and electrical and optical properties of these as-deposited layers are studied by atomic force microscopy, X-ray diffraction, J-E curves, and photoluminescence studies, respectively. The optimum deposition conditions for Alq3 amorphous layers with respect to Tsub are also discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1631-1632 |
| Number of pages | 2 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 43 |
| Issue number | 4 A |
| DOIs | |
| State | Published - 1 Jan 2004 |
Keywords
- Fabrication of films and layered structure
- Organic materials and devices
- Structure and properties of films
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Chung, J. M., Luo, Y. Z., Jian, Z. A., Kuo, M. C., Yang, C. S., Chou, W-C., & Chiu, K. C. (2004). Effects of substrate temperature on the properties of Alq3 amorphous layers prepared by vacuum deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 43(4 A), 1631-1632. https://doi.org/10.1143/JJAP.43.1631