Effects of isomeric transformation on characteristics of Alq3 amorphous layers prepared by vacuum deposition at various substrate temperatures

Zhi An Jian*, Ying Zi Luo, Jia Ming Chung, Shiow Jing Tang, Ming Chin Kuo, Ji Lin Shen, Kuan Cheng Chiu, Chu Shou Yang, Wu-Ching Chou, Chung Feng Dai, Jui Ming Yeh

*Corresponding author for this work

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Abstract

Organic tris(8-hydroxyquinoline)aluminum (Alq3) amorphous layers are prepared by vacuum deposition at various substrate temperatures Tsub from 30 to 180 °C. The surface morphology and electrical characteristics of these as-deposited layers are studied by atomic force microscopy and current-density versus electric-field (J-E) curves. The temperature dependence of the dark electrical conductivity (T) determined from J-E curves is also examined. These experimental results reveal that the surface and electrical properties of Alq3 amorphous layers deposited at Tsub between 90 and 120 °C exhibit an anomalous Tsub dependence. However, this anomalous Tsub dependence is not observed from infrared absorption measurements, and therefore is not the result of chemical degradation. The observed behavior is explained in terms of the property that the vacuum deposition of Alq3 with Tsub between 90 and 120 °C involves a thermal interconversion between meridional and facial Alq3 isomers.

Original languageEnglish
Article number123708
JournalJournal of Applied Physics
Volume101
Issue number12
DOIs
StatePublished - 2 Aug 2007

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    Jian, Z. A., Luo, Y. Z., Chung, J. M., Tang, S. J., Kuo, M. C., Shen, J. L., Chiu, K. C., Yang, C. S., Chou, W-C., Dai, C. F., & Yeh, J. M. (2007). Effects of isomeric transformation on characteristics of Alq3 amorphous layers prepared by vacuum deposition at various substrate temperatures. Journal of Applied Physics, 101(12), [123708]. https://doi.org/10.1063/1.2749209