Effective strategy for porous organosilicate to suppress oxygen ashing damage

Po-Tsun Liu*, T. C. Chang, Y. S. Mor, C. W. Chen, T. M. Tsai, C. J. Chu, Fu-Ming Pan, S. M. Szea

*Corresponding author for this work

Research output: Contribution to journalArticle

23 Scopus citations

Abstract

Photoresist stripping with oxygen plasma ashing destroys numerous functional groups in porous organosilicate glasses (OSGs). This impact makes the porous OSG relatively hydrophilic and causes low-k dielectric degradation. To mitigate these issues, various strategies are investigated to enhance oxygen plasma resistance of the porous OSG. These include physical and chemical procedures. Both structural and electrical analyses are used to determine their efficiency. In addition, an optimum prescription that consists of H2 plasma and chemical trimethylchlorosilane treatment is developed in this work. The enhancement of oxygen plasma resistance can provide the porous OSG for practical application in the multilevel interconnection.

Original languageEnglish
JournalElectrochemical and Solid-State Letters
Volume5
Issue number3
DOIs
StatePublished - 1 Mar 2002

Fingerprint Dive into the research topics of 'Effective strategy for porous organosilicate to suppress oxygen ashing damage'. Together they form a unique fingerprint.

  • Cite this