Effect of trimethylsilylation on the film stress of mesoporous silica ultralow-k film stacks

Jr Yu Chen*, Fu-Ming Pan, Da Xien Lin, An Thung Cho, Kuei Jung Chao, Li Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy