Effect of remote-surface-roughness scattering on electron mobility in MOSFETs with high-k dielectrics

M. Mamatrishat*, M. Kouda, T. Kawanago, K. Kakushima, P. Ahmet, A. Aierken, K. Tsutsui, A. Nishiyama, N. Sugii, K. Natori, H. Iwai

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

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Engineering & Materials Science