Effect of interfacial layer on device performance of metal oxide thin-film transistor with a multilayer high-k gate stack

Dun Bao Ruan, Po-Tsun Liu*, Yu Chuan Chiu, Po Yi Kuo, Min Chin Yu, Kai Zhi Kan, Ta Chun Chien, Yi Heng Chen, Simon M. Sze

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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