Effect of geometric nanostructures on the absorption edges of 1-D and 2-D TiO2 fabricated by atomic layer deposition

Yung Huang Chang, Chien Min Liu, Hsyi En Cheng, Chih Chen*

*Corresponding author for this work

Research output: Contribution to journalArticle

16 Scopus citations

Abstract

2-Dimensional (2-D) TiO2 thin films and 1-dimensional (1-D) TiO2 nanotube arrays were fabricated on Si and quartz substrates using atomic layer deposition (ALD) with an anodic aluminum oxide (AAO) template at 400 C. The film thickness and the tube wall thickness can be precisely controlled using the ALD approach. The intensities of the absorption spectra were enhanced by an increase in the thickness of the TiO2 thin film and tube walls. A blue-shift was observed for a decrease in the 1-D and 2-D TiO2 nanostructure thicknesses, indicating a change in the energy band gap with the change in the size of the TiO2 nanostructures. Indirect and direct interband transitions were used to investigate the change in the energy band gap. The results indicate that both quantum confinement and interband transitions should be considered when the sizes of 1-D and 2-D TiO2 nanostructures are less than 10 nm.

Original languageEnglish
Pages (from-to)3549-3555
Number of pages7
JournalACS Applied Materials and Interfaces
Volume5
Issue number9
DOIs
StatePublished - 8 May 2013

Keywords

  • 1-D TiO nanotube arrays
  • 2-D TiO thin films
  • anodic aluminum oxide
  • atomic layer deposition
  • interband transitions
  • quantum confinement

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