Effect of deposition temperature and post-heat-treatment condition on the characteristics of (100)-self-orientation LaNiO3 films prepared by RF magnetron sputter deposition

Kenji Takahashi*, Muneyasu Suzuki, Takahiro Oikawa, H. D. Chen, Hiroshi Funakubo

*Corresponding author for this work

Research output: Contribution to journalConference article

4 Scopus citations


La-Ni-O films were deposited at deposition temperature ranging from 250 to 540°C by rf magnetron sputter deposition. The effects of deposition temperature and the following heat-treatment condition on the constituent phases and characteristics of LaNiO3 films were investigated. LaNiO 3 phase was obtained at the deposition temperature of 250 and 360°C, while La-rich phase of La2NiO4 was appeared above 540°C. Crystalline phases of resultant films after the following heat-treatment strongly depended on the partial pressure of oxygen gas in ambience, i.e., in case of the heat-treatment at 800°C, diffraction peaks originated from LaNiO3 phase disappeared on XRD patterns in pure nitrogen gas ambience, while impurity peaks of NiO appeared in oxygen-excess (>50%) ambience. As a result, LaNiO3 films with high crystallinity and the same lattice parameter as the bulk one were obtained in the deposition at 360°C followed by the heat-treatment at 700°C in air.

Original languageEnglish
Article numberG1.9
Pages (from-to)35-40
Number of pages6
JournalMaterials Research Society Symposium Proceedings
StatePublished - 1 Jan 2005
EventMaterials, Intergration and Packaging Issues for High-Frequency Devices II - Boston, MA, United States
Duration: 29 Nov 20041 Dec 2004

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