Effect of carrier gas on the structure and electrical properties of low dielectric constant SiCOH film using trimethylsilane prepared by plasma enhanced chemical vapor deposition

Y. L. Cheng*, Y. L. Wang, J. K. Lan, H. C. Chen, J. H. Lin, Y. L. Wu, Po-Tsun Liu, Yew-Chuhg Wu, M. S. Feng

*Corresponding author for this work

Research output: Contribution to journalArticle

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