Doppler: DPL-aware and OPC-friendly gridless detailed routing with mask density balancing

Yen Hung Lin*, Yong Chan Ban, David Z. Pan, Yih-Lang Li

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

The printed image of a layout that satisfies the double patterning lithograph (DPL) constraints may not have good fidelity if the layout neglects optical proximity correction (OPC). Simultaneously considering DPL and OPC becomes necessary when gene rating layouts, especially in routing stage. Moreover, one decomposed design with balanced mask density has a lower edge placement error (EPE)than an unbalance done[6]. This work proposes a compre-hensive conflict graph (CCG)to enable detailed routers to simultaneously consider DPL, OPC, and mask density to gene rate litho-friendly layouts. This work then develops an DPL-aware and OPC-friendly gridless detailed routing (DOPPLER) by applying CCG in a gridless routing model. A density variation threshold annealing-based routing flow is also proposed to prevent DOPPLER from falling into a sub-optimal mask density balance. Compared with existing DPL-aware detailed routing works, DOPPLER demon-stratesanaverage 73.84% of EPE hotspot reduction with a satisfactory mask density at the cost of an average increase of 0.08% wire-length, 15.14% number of stitches, and 77.28% runtime.

Original languageEnglish
Title of host publication2011 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2011
Pages283-289
Number of pages7
DOIs
StatePublished - 1 Dec 2011
Event2011 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2011 - San Jose, CA, United States
Duration: 7 Nov 201110 Nov 2011

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)1092-3152

Conference

Conference2011 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2011
CountryUnited States
CitySan Jose, CA
Period7/11/1110/11/11

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