Dopant diffusion in silicon substrate during oxynitride process

N. Aoki*, T. Yaegashi, Y. Takeuchi, M. Fujiwara, N. Kusunoki, T. Sato, I. Mizushima, Y. Tsunashima, H. Hazama, S. Aritome, Shirota Riichiro, T. Shimizu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

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Chemical Compounds

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