Directional growth of copper phthalocyanine crystal by selective chemical vapor deposition method

A. Sekiguchi*, T. Uchida, H. Sugimura, N. Shimo, Hiroshi Masuhara

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Novel deposition behavior was observed when 1,4-dicyanobenzene was sublimed onto copper micropatterns on silicon wafer. On the patterns copper-phthalocyanine whiskers and debris of similar size were formed and preferentially oriented along or perpendicular to the copper lines. The directional growth was confirmed to have nothing to do with crystal axis of the silicon, but was considered to be due to the periodic structure of the copper lines.

Original languageEnglish
Pages (from-to)1367-1369
Number of pages3
JournalApplied Physics Letters
Volume65
Issue number11
DOIs
StatePublished - 1 Dec 1994

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