Direct electron-beam patterning on a nanometer scale of CaF2 layers grown by MBE on silicon 〈111〉.

Richard Zanetti*, J. H. Paterson, G. A. Jones, King-Ning Tu, L. M. Brown

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

MBE grown calcium fluoride has been directly patterned using an 100 keV electron beam. An array of dots 4 nm in diameter with a period of 15 nm and lines 7 nm wide are reported. The dependence of the damage process on beam current showed that there is a simple dose requirement of 9 × 103 C.cm-2, which corresponds to 5 × 108 e-nm-2. Complete holes were not observed. Electron energy loss spectroscopy studies indicate that fluorine has been removed and metallic calcium is left in the damaged region. The damage process was studied with the sample orientated along the 〈111〉 direction and tilted away from this axis by up to 10 degrees. No orientation dependence in the hole size or dose required was observed.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherPubl by Int Soc for Optical Engineering
Pages228-233
Number of pages6
ISBN (Print)0819408379
DOIs
StatePublished - 1 Dec 1992
EventAdvanced Semiconductor Epitaxial Growth Processes and Lateral and Vertical Fabrication - Somerset, NJ, USA
Duration: 23 Mar 199226 Mar 1992

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1676
ISSN (Print)0277-786X

Conference

ConferenceAdvanced Semiconductor Epitaxial Growth Processes and Lateral and Vertical Fabrication
CitySomerset, NJ, USA
Period23/03/9226/03/92

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    Zanetti, R., Paterson, J. H., Jones, G. A., Tu, K-N., & Brown, L. M. (1992). Direct electron-beam patterning on a nanometer scale of CaF2 layers grown by MBE on silicon 〈111〉. In Proceedings of SPIE - The International Society for Optical Engineering (pp. 228-233). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 1676). Publ by Int Soc for Optical Engineering. https://doi.org/10.1117/12.137664