Direct CoSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation

Juin Jie Chang; Chuan Pu Liu; Shih Wei Chen; Chih Chia Chang; Tsung-Eong Hsien; Ying Lang Wang

doi:10.1116/1.1781660

Direct CoSi₂ thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation

Juin Jie Chang, Chuan Pu Liu^*, Shih Wei Chen, Chih Chia Chang, Tsung-Eong Hsien, Ying Lang Wang

^*Corresponding author for this work

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Original language	English
Pages (from-to)	2299-2302
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	5
DOIs	https://doi.org/10.1116/1.1781660
State	Published - 1 Jan 2004

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10.1116/1.1781660

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@article{2ba6d4ca5389476a9a072f6ee7f43d99,

title = "Direct CoSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation",

author = "Chang, {Juin Jie} and Liu, {Chuan Pu} and Chen, {Shih Wei} and Chang, {Chih Chia} and Tsung-Eong Hsien and Wang, {Ying Lang}",

year = "2004",

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day = "1",

doi = "10.1116/1.1781660",

language = "English",

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issn = "1071-1023",

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}

Direct CoSi₂ thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation. / Chang, Juin Jie; Liu, Chuan Pu; Chen, Shih Wei; Chang, Chih Chia; Hsien, Tsung-Eong; Wang, Ying Lang.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 22, No. 5, 01.01.2004, p. 2299-2302.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Direct CoSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation

AU - Chang, Juin Jie

AU - Liu, Chuan Pu

AU - Chen, Shih Wei

AU - Chang, Chih Chia

AU - Hsien, Tsung-Eong

AU - Wang, Ying Lang

PY - 2004/1/1

Y1 - 2004/1/1

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U2 - 10.1116/1.1781660

DO - 10.1116/1.1781660

M3 - Article

AN - SCOPUS:9744221150

VL - 22

SP - 2299

EP - 2302

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

SN - 1071-1023

IS - 5

ER -

Direct CoSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation

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Direct CoSi₂ thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation