Device and reliability of high-K Al2O3 gate dielectric with good mobility and low Dit

Albert Chin*, C. C. Liao, C. H. Lu, W. J. Chen, C. Tsai

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

111 Scopus citations

Fingerprint Dive into the research topics of 'Device and reliability of high-K Al<sub>2</sub>O<sub>3</sub> gate dielectric with good mobility and low D<sub>it</sub>'. Together they form a unique fingerprint.

Engineering & Materials Science