Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror

Jyh Hua Ting*, Shiuann Huah Shiau, Yeong Jyh Chen, Bau Tong Dai, Fu-Ming Pan, H. Wong, G. M. Pu, Chung Yuan Kung

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSixNy) is sputtered from CoSi2 target in Ar/N2 discharge. Stress and sheet resistance of the CoSixNy film are evaluated.

Original languageEnglish
Title of host publication2002 International Microprocesses and Nanotechnology Conference, MNC 2002
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages232-233
Number of pages2
ISBN (Electronic)4891140313, 9784891140311
DOIs
StatePublished - 1 Jan 2002
EventInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
Duration: 6 Nov 20028 Nov 2002

Publication series

Name2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2002
CountryJapan
CityTokyo
Period6/11/028/11/02

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