Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror

Jyh Hua Ting; Shiuann Huah Shiau; Yeong Jyh Chen; Bau Tong Dai; Fu-Ming Pan; H. Wong; G. M. Pu; Chung Yuan Kung

doi:10.1109/IMNC.2002.1178629

Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror

Jyh Hua Ting^*, Shiuann Huah Shiau, Yeong Jyh Chen, Bau Tong Dai, Fu-Ming Pan, H. Wong, G. M. Pu, Chung Yuan Kung

^*Corresponding author for this work

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSi_xN_y) is sputtered from CoSi₂ target in Ar/N₂ discharge. Stress and sheet resistance of the CoSi_xN_y film are evaluated.

Original language	English
Title of host publication	2002 International Microprocesses and Nanotechnology Conference, MNC 2002
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	232-233
Number of pages	2
ISBN (Electronic)	4891140313, 9784891140311
DOIs	https://doi.org/10.1109/IMNC.2002.1178629
State	Published - 1 Jan 2002
Event	International Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan Duration: 6 Nov 2002 → 8 Nov 2002

Publication series

Name	2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Conference

Conference	International Microprocesses and Nanotechnology Conference, MNC 2002
Country	Japan
City	Tokyo
Period	6/11/02 → 8/11/02

Access to Document

10.1109/IMNC.2002.1178629

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Ting, J. H., Shiau, S. H., Chen, Y. J., Dai, B. T., Pan, F-M., Wong, H., Pu, G. M., & Kung, C. Y. (2002). Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror. In 2002 International Microprocesses and Nanotechnology Conference, MNC 2002 (pp. 232-233). [1178629] (2002 International Microprocesses and Nanotechnology Conference, MNC 2002). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2002.1178629

Ting, Jyh Hua ; Shiau, Shiuann Huah ; Chen, Yeong Jyh ; Dai, Bau Tong ; Pan, Fu-Ming ; Wong, H. ; Pu, G. M. ; Kung, Chung Yuan. / Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror. 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., 2002. pp. 232-233 (2002 International Microprocesses and Nanotechnology Conference, MNC 2002).

@inproceedings{3194756a737442a5a6575466617c7a01,

title = "Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror",

abstract = "The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSixNy) is sputtered from CoSi2 target in Ar/N2 discharge. Stress and sheet resistance of the CoSixNy film are evaluated.",

author = "Ting, {Jyh Hua} and Shiau, {Shiuann Huah} and Chen, {Yeong Jyh} and Dai, {Bau Tong} and Fu-Ming Pan and H. Wong and Pu, {G. M.} and Kung, {Chung Yuan}",

year = "2002",

month = jan,

day = "1",

doi = "10.1109/IMNC.2002.1178629",

language = "English",

series = "2002 International Microprocesses and Nanotechnology Conference, MNC 2002",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "232--233",

booktitle = "2002 International Microprocesses and Nanotechnology Conference, MNC 2002",

address = "United States",

note = "null ; Conference date: 06-11-2002 Through 08-11-2002",

}

Ting, JH, Shiau, SH, Chen, YJ, Dai, BT, Pan, F-M, Wong, H, Pu, GM & Kung, CY 2002, Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror. in 2002 International Microprocesses and Nanotechnology Conference, MNC 2002., 1178629, 2002 International Microprocesses and Nanotechnology Conference, MNC 2002, Institute of Electrical and Electronics Engineers Inc., pp. 232-233, International Microprocesses and Nanotechnology Conference, MNC 2002, Tokyo, Japan, 6/11/02. https://doi.org/10.1109/IMNC.2002.1178629

Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror. / Ting, Jyh Hua; Shiau, Shiuann Huah; Chen, Yeong Jyh; Dai, Bau Tong; Pan, Fu-Ming; Wong, H.; Pu, G. M.; Kung, Chung Yuan.

2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc., 2002. p. 232-233 1178629 (2002 International Microprocesses and Nanotechnology Conference, MNC 2002).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

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AU - Ting, Jyh Hua

AU - Shiau, Shiuann Huah

AU - Chen, Yeong Jyh

AU - Dai, Bau Tong

AU - Pan, Fu-Ming

AU - Wong, H.

AU - Pu, G. M.

AU - Kung, Chung Yuan

PY - 2002/1/1

Y1 - 2002/1/1

N2 - The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSixNy) is sputtered from CoSi2 target in Ar/N2 discharge. Stress and sheet resistance of the CoSixNy film are evaluated.

AB - The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSixNy) is sputtered from CoSi2 target in Ar/N2 discharge. Stress and sheet resistance of the CoSixNy film are evaluated.

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DO - 10.1109/IMNC.2002.1178629

M3 - Conference contribution

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T3 - 2002 International Microprocesses and Nanotechnology Conference, MNC 2002

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BT - 2002 International Microprocesses and Nanotechnology Conference, MNC 2002

PB - Institute of Electrical and Electronics Engineers Inc.

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Ting JH, Shiau SH, Chen YJ, Dai BT, Pan F-M, Wong H et al. Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror. In 2002 International Microprocesses and Nanotechnology Conference, MNC 2002. Institute of Electrical and Electronics Engineers Inc. 2002. p. 232-233. 1178629. (2002 International Microprocesses and Nanotechnology Conference, MNC 2002). https://doi.org/10.1109/IMNC.2002.1178629

Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror

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