Development of a confined pulse-jet particle cleaning technology for semiconductor wafers

H. Chein*, T. Y. Huang, Chuen-Tinn Tsai

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
JournalJournal of Aerosol Science
Volume29
Issue numberSUPPL.2
DOIs
StatePublished - 1 Jan 1998

Keywords

  • Particle Cleaning
  • Pulse-Jet
  • Semiconductor Wafers

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