Determination of phonon dispersions from x-ray transmission scattering: The example of silicon

M. Holt, Z. Wu, Hawoong Hong, P. Zschack, P. Jemian, J. Tischler, H. D. Chen, T. C. Chiang*

*Corresponding author for this work

Research output: Contribution to journalArticle

53 Scopus citations

Abstract

A beam of monochromatic synchrotron x-ray incident on a silicon wafer creates a rich intensity pattern behind the wafer that reflects the cross section of scattering by thermally populated phonons. A least-squares fit of the patterns based on a lattice dynamics calculation yields the phonon dispersion relations over the entire reciprocal space. This simple and efficient method is suitable for phonon studies in essentially all materials and complements the traditional neutron scattering technique. 1999

Original languageEnglish
Pages (from-to)3317-3319
Number of pages3
JournalPhysical Review Letters
Volume83
Issue number16
DOIs
StatePublished - 18 Oct 1999

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