Design, fabrication and actuation of 4-axis thermal actuating image stabilizer

Chun Ying Lin*, Tsung Ying Tsai, Jin-Chern Chiou, Chin Ping Chien

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This work presents a MEMS-based (micro-electro-mechanical system) thermal actuating image stabilizer. The proposed stage is designed as a 4-axis decoupling XY stage and 1.49 × 1.49 × 0.4 mm3 in size. This stabilizer is fabricated by Silicon on Isolator (SOI) process, including inductively coupled plasma (ICP) process and flip-chip bonding technique. The maximum actuating distance of the stage is 25 μm which is sufficient to resolve the anti-shaking problem in 3X optical zoom condition of a three mega pixels image sensor. According to the simulation of CoventorWare, the supplied voltage for the 25 μm moving distance is lower than 20 volts.

Original languageEnglish
Title of host publicationNEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
Pages192-196
Number of pages5
DOIs
StatePublished - 4 Oct 2011
Event6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011 - Kaohsiung, Taiwan
Duration: 20 Feb 201123 Feb 2011

Publication series

NameNEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Conference

Conference6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011
CountryTaiwan
CityKaohsiung
Period20/02/1123/02/11

Keywords

  • MEMS
  • thermal actuator
  • XY stage

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    Lin, C. Y., Tsai, T. Y., Chiou, J-C., & Chien, C. P. (2011). Design, fabrication and actuation of 4-axis thermal actuating image stabilizer. In NEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (pp. 192-196). [6017327] (NEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems). https://doi.org/10.1109/NEMS.2011.6017327