Design and analysis of a 2-DOF planar nano-positioner with low parasitic rotation

Hung Ruei Lin, Shao-Kang Hung, Chiao Hua Cheng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

This paper presents the design processes and performance of a new piezoactuated nano-positioner with low parasitic rotation. The flexure-based stage is composed of two symmetric flexure guiding mechanisms and two piezo stack actuators (PSAs) which have a 45 degree angle with X and Y directions. By analyzing the layout of the stage with kinematics and finite element analysis (FEA) results, it shows that this novel design offers a characteristic of low parasitic rotation. Analytical models of PSAs and stage are derived to assess the performances and to decide the parameters of geometry sizes of the hinge and the stage, total stroke, maximum von-Mises stress, and lifetime. A prototype of the stage is then fabricated, and its performances are tested. Two laser displacement sensors and PID control method are used to achieve a feedback control of the system. Experimental results reveal that the stage has stroke of 500 μm × 500 μm, resolution of 10 nm, and maximum parasitic rotation of 0.48 arc sec under stroke of ±50 μm.

Original languageEnglish
Title of host publication2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014 - Conference Proceedings
EditorsPasi Kallio
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages48-52
Number of pages5
ISBN (Electronic)9781479979233
DOIs
StatePublished - 9 Mar 2014
Event4th International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014 - Taipei, Taiwan
Duration: 27 Oct 201431 Oct 2014

Publication series

Name2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014 - Conference Proceedings

Conference

Conference4th International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014
CountryTaiwan
CityTaipei
Period27/10/1431/10/14

Keywords

  • flexure mechanism
  • parasitic rotation
  • planar positioner

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